Computational Physics
& Materials Design Laboratory

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113.

Thermal conductivities of fluorite LnO2 and bixbyite Ln2O3 expitalxal films.

submitted (2025).

112.

Dual-Doping Strategy for Suppressing Thermal Collapse in Ultrahigh-Nickel Cathodes.

submitted (2025).

111.

Emergence of Metastable Phases in TMO via Ostwald Step Rules Governed by NET.

submitted (2025).

110.

*ML-driven spectroscopic mapping of Vo distribution and morphology in IrOx.

submitted (2025).

109.

Plasmonic polaron in self-intercalated 1T-TiS2.

submitted (2025).

108.

Jaejin Hwang+, Seung-Gyo Jeong+, Taewon Min, Woo-Seok Choi*, Jaekwang Lee*

Interlayer-Coupled-Induced Dimensional Mott Transition in Monolayer Oxide Superlattices.

under review in PRL (2025).

107.

Dayeong Kwon, Sang-hun Lee, Eunji Lee, Jaejin Hwang, Jaekwang Lee, Jeongyong Kim*, Jinsoo Joo*

Observation of Ultranarrow Band RP from Pure OSA-T2T Micro-Rods: A Route to High-Resolution Light Sources

Advanced Science e18814 (2025)

106.

Yeongrok Jin, Seongmun Kim, Yeo-Geon Yoon, Taekjoon Lee, Jae Bok Chang, Kyung Sig Lee, Nari Ahn, 

Ran Kim*, Young-gil Park*, Jaekwang Lee*

Defect-Cascade-Induced Photodegradation in InP/ZnSe/ZnS Quantum Dots.

Advanced Science e15691 (2025)

105.

Jinhyuk Jang+, Yeongrok Jin+, Yeon-Seo Nam+, Heung-Sik Park, Jaegyu Kim, Kyeong Tae Kang, Yerin So, 

Jiwoung Choi, Youngchang Choi, Jaechan Shim, Panithan Sriboriboon, Dong Kyu Lee, Kyoung-June Go, 

Gi-Yeop Kim, Seungbum Hong, Jun Hee Lee, Daesu Lee, Myung-Geun Han, Junwoo Son, Yunseok Kim, 

Hiroki Taniguchi, Seokhyeong Kang, Jang-Sik Lee, He Tian, Chan-Ho Yang, Yimei Zhu, Sang-Wook Cheong, 

Woo Seok Choi*, Jaekwang Lee*, Si-Young Choi*

Sub-unit-cell-segmented ferroelectricity in brownmillerite oxides by phonon decoupling

Nature Materials 24, 1228-1235 (2025)

104.

Sangwoo Lee+, Jaejin Hwang+, Joonbong Lee, Hyunbin Chung, Dae Haa Ryu, Heeseo Yun, In Gyu Choi, Hyojun Jung, Kwanwoo Lee, Sanghak Yeo, Sungwoo Lee, Jaeyoung Yang, Ho Jung Jeon, You Seung Rim, 

Jaekwang Lee*, Taekjib Choi*

Optimizing Low-k SiCOH films deposited by PECVD with a novel C6H16OSi precursor:Impact of O/C ratio.

Materials Chemistry and Physics 334, 130510 (2025)



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